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Due to the limited processing accuracy of the platform and unevenness of the glass substrate itself, a holographic lithography system is prone to out-of-focus imaging problems; therefore, the real-time focusing components are critical for holographic lithography systems. In this paper, a real-time focus monitoring and adjusting system using an electrically tunable lens (ETL) for large-area lithography is introduced. Combined with the ETL, the limited depth of field of the microscopic objective has been effectively expanded, and the automa
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